Dry vacuum pumps utilizing vacuum technology to create a clean environment

Dry vacuum pumps creating a vacuum environment crucial for semiconductor manufacturing


In the course of processing wafers that form the semiconductor substrate, air is removed from the processing space called a chamber using a vacuum pump to increase the degree of vacuum as much as possible in order to prevent contamination by impurities (such as gas molecules). Dry vacuum pumps developed by the Precision Machinery Company are essential to this process. They function to remove gas molecules from the chamber and because oil is not used in parts that come into contact with the gas, they create a clean vacuum without the risk of contamination due to backflow or diffusion of water or oil. We launched our dry vacuum pumps in 1986 and currently hold the second-largest market share in the world. With more than 50 service locations worldwide, our global and reliable support framework is relied upon by many companies around the world.